Description
| Product | Specification | |||
| PURITY | PACKAGE | VALVE | CONTENT | |
| CHF3 | 5N | 47L | DISS716 | 30 |
CHF3
0$
In the semiconductor industry, trifluoromethane (CHF3) is used in plasma etching, and it can also be used as a refrigerant, named R-23 or HFC-23. Since it is without Cl so will not cause holes in the ozone layer, it sometimes replaces the CFC-13 to protect the environment.
